Interference Lithography
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چکیده
Interference lithography (IL) is the preferred method for fabricating periodic and quasi-periodic patterns that must be spatially coherent over large areas. IL is a conceptually simple process where two coherent beams interfere to produce a standing wave, which can be recorded in a photoresist. The spatial-period of the grating can be as fine as half the wavelength of the interfering light, allowing for structures on the order of 100nm from UV wavelengths, and features as small as 30-40 nm using a deep UV ArF laser.
منابع مشابه
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تاریخ انتشار 2002